Ipc g03f

Web26 jul. 2024 · G03F 7/20 Title A PRINTING FORM PRECURSOR AND PRINTING FORM THEREOF Abstract The invention pertains to a printing form precursor, and particularly a printing form precursor that can form printing forms, or … Web技術分野は各案件の筆頭IPCを集計しています。 出願人 件数 うち筆頭件数 サムスン電子 85 85 Apple Inc. 53 53 LGエレクトロニクス 43 43 サムスンディスプレイ 32 32 現代自 …

EP 0843221 B1 20040506 - Projection exposure apparatus

Web14 okt. 2024 · Abstract. An electrostatic clamp for holding an object by electrostatic force is disclosed. The electrostatic clamp comprises a dielectric member having a … WebG03F - Fotomechanisch produceren van getextureerde of gepatroneerde oppervlakken, bijv. voor het afdrukken of voor het bewerken van halfgeleiderinrichtingen; materialen … orc10x250 https://typhoidmary.net

G03F 7/20 G03F 1/72 G03F 1/36 G03F 1/70 H01J 37/32 G03F, H01J

Web12 feb. 2024 · 高世代面板铜制程光刻胶剥离液 技术领域 [0001]本发明涉及剥离液技术领域， 更具体的说是涉及一种高世代面板铜制程光刻胶 ... WebCPC Scheme - G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF … WebWe suggest the addition of informative notes to subclass G03F for photomechanical processing of semiconductor devices and H01L 27/00 for semiconductor or other solid … ips butler 60

PHOTOSENSITIVE MATERIAL, TRANSFER FILM, MANUFACTURING …

Category:光刻胶、光刻胶的图案化方法及集成电路板的刻蚀方法_专利查询

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Ipc g03f

SECTION G — PHYSICS

WebClassification of the application (IPC): G03F 1/70, H01L 21/3065, G03F 1/36 Technical fields searched (IPC): G03F, G06F DOCUMENTS CONSIDERED TO BE RELEVANT … WebClassification of the application (IPC): G03F 7/004, G03F 7/16 Technical fields searched (IPC): G03F DOCUMENTS CONSIDERED TO BE RELEVANT CategoryA WO …

Ipc g03f

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WebA system comprises a reflective optical element with a reflective surface that is configured to reflect a radiation beam. The reflective optical element also has a body. The system includes a thermal conditioning mechanism operative to thermally induce a deformation of the body under control of a controller. By means of controllably deforming the body, the shape of … WebPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES (for photomechanical purposes G03F); PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, …

WebPROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a color filter, which is improved in development durability and contrast, and a pattern forming … Web列表数据仅在虚线下方。 全文数据即将推出。

Web26 mei 2024 · International Filing Date 26.05.2024 IPC G03F 7/004 C07C 43/205 C07D 307/93 C07D 321/10 C07C 69/708 Title SALT, ACID GENERATOR, RESIST … Web588740495 - EP 4163721 A1 20240412 - CHAMBER FOR A PROJECTION SYSTEM OF A LITHOGRAPHIC APPARATUS, PROJECTION SYSTEM AND LITHOGRAPHIC …

Web20 jun. 2024 · IPC G03F 7/20 Title OVERLAYING ON LOCALLY DISPOSITIONED PATTERNS BY ML BASED DYNAMIC DIGITAL CORRECTIONS (ML-DDC) Abstract Systems and methods disclosed are generally related to masklessly developing connections between a chip-group and a design connection point on a substrate.

Webusing a particular method of attachment to the solid support. C40B 60/00. Apparatus specially adapted for use in combinatorial chemistry or with libraries. C40B 60/02. . … ips cabinetips by cpuWeb12 feb. 2024 · 本发明公开了一种高世代面板铜制程光刻胶剥离液，包括以下质量组分：酰胺：50‑60％；醇醚：35‑45％；环胺与链胺：3‑7％；缓蚀剂：0.4％‑0.8％；润湿剂：0.1％‑0.4％。 本发明经过大量的试验，创造性的发现，在剥离液中加入润湿剂，能够使高世代面板更易被水浸湿的物质，通过降低其表面张力或界面张力，使水能展开在高世代 … ips by countryWebg03f cpc cooperative patent classification g physics (notes omitted) instruments g03 photography; cinematography; analogous techniques using waves other than optical … ips butler 55WebClassification of the application (IPC): G03F 7/20, G03F 1/72, G03F 1/36, G03F 1/70, H01J 37/32 Technical fields searched (IPC): G03F, H01J DOCUMENTS CONSIDERED TO … ips ca syncWeb11 sep. 2024 · International Filing Date 09.11.2024 IPC G03F 7/20 G03F 9/00 Title A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND ASSOCIATED APPARATUSES Abstract Disclosed is a method for modeling measurement data over a substrate area relating to a substrate in a lithographic process. ips cadre allocation 2018 pdfWeb12 mei 2013 · International Filing Date 31.05.2013 IPC G03F 7/004 C08F 212/02 G03F 7/039 H01L 21/027 Title ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND … ips cabecera telefono